Excimer Laser Annealing System for High-resolution Panels

Excimer Laser Annealing (ELA) system converts amorphous silicon layer on a glass substrate to poly-silicon one, which is generally used in TFT (Thin Flat Transistor) of the high-resolution panels. ELA System is essential for the production of high-resolution panels, such as smartphones, digital cameras and portable gaming devices.

 

Sales Records

Since 1995, we have sold over 200 systems to display companies in Japan, South Korea, Taiwan, China and Singapore, as one of the top manufacturers of ELA system.

Features

  • Available for the largest glass substrate
  • Extention of process margin : Pulse Extender, improvement of ununiformity (mura) and mitigation of pulse fluctuation
  • Reduction of maintenance cost : Extention of tube life time
  • Inhabitation of vibration
  • Introduction of the new control system : improvement of energy stability and operatability

Specifications

Glass size / mm ≧G6
Laser / Optics Tri Vyper+LB1500 
Wave length / nm 308
Max. pulse energy / mJ 6,000
Max. power / W 3,600
Max. Rep. rate / Hz 600
Pulse energy stability / ±3 sigma(combined beam) % ≦1.8
Line Beam size / SA x LA mm2 0.5 x 1,570
Energy density / mJcm-2 430
Throughput / pieces/hour 26.4*
Foot print / W x L m2 (including maintenance area) 13.5 x 19.2
Total weight / kg 140,000 (140 ton)
Glass size / mm ≧G6